Open Access

High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency

Nanoscale Research Letters20072:123

DOI: 10.1007/s11671-007-9042-z

Received: 13 December 2006

Accepted: 25 January 2007

Published: 27 February 2007


The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM) sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency frwas investigated in detail. It was found that the increase of frfrom 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate aDof sputtered TiO2films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO2films can be sputtered on unheated glass substrates at aD = 80 nm/min, Tsurf < 180 °C when high value of fr = 350 kHz was used. Properties of a thin hydrophilic TiO2film deposited on a polycarbonate substrate are given.


TiO2film Hydrophilicity Deposition rate Unheated substrate Dual magnetron sputtering Polycarbonate




This work was supported in part by the Ministry of Education of the Czech Republic under Project No. MSM 4977751302 and in part by the Grant Agency of the Czech Republic under Project No. 106/06/0327.

Authors’ Affiliations

Department of Physics, University of West Bohemia
Department of Physics, J.E. Purkyně University


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© to the authors 2007