Open Access

High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency

Nanoscale Research Letters20072:123

DOI: 10.1007/s11671-007-9042-z

Received: 13 December 2006

Accepted: 25 January 2007

Published: 27 February 2007


The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM) sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency frwas investigated in detail. It was found that the increase of frfrom 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate aDof sputtered TiO2films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO2films can be sputtered on unheated glass substrates at aD = 80 nm/min, Tsurf < 180 °C when high value of fr = 350 kHz was used. Properties of a thin hydrophilic TiO2film deposited on a polycarbonate substrate are given.


TiO2film Hydrophilicity Deposition rate Unheated substrate Dual magnetron sputtering Polycarbonate




This work was supported in part by the Ministry of Education of the Czech Republic under Project No. MSM 4977751302 and in part by the Grant Agency of the Czech Republic under Project No. 106/06/0327.

Authors’ Affiliations

Department of Physics, University of West Bohemia
Department of Physics, J.E. Purkyně University


  1. Fujishima A, Honda K: Nature. 1972, 238: 37. COI number [1:CAS:528:DyaE38XltVykurw%3D] 10.1038/238037a0View Article
  2. Sakai N, Fujishima A, Watanable T, Hashimoto K: J. Phys. Chem. B. 2003, 107: 1028. COI number [1:CAS:528:DC%2BD3sXhtFI%3D] 10.1021/jp022105pView Article
  3. A. Fujishima, X. Zhang, C.R. Chimie 9, 750 (2006)
  4. L. Miao, S. Tanemura, Y. Kondo, M. Iwata, S. Toh et al., Appl. Surf. Sci. 238, 125 (2004)
  5. O.H. Fenner, in Handbook of Plastics and Elastomers, ed. By C. A. Harper (McGraw-Hill, New York USA 1975)
  6. Musil J, Herman D, Sicha J: J. Vac. Sci. Technol. A. 2006,24(3):521. COI number [1:CAS:528:DC%2BD28XksFCgtr0%3D] 10.1116/1.2187993View Article
  7. Zeman P, Takabayashi S: J. Vac. Sci. Technol. A. 2001,20(2):1.
  8. Zhao G, Tian Q, Liu Q, Han G: Surf. Coat. Technol.. 2005, 198: 55. COI number [1:CAS:528:DC%2BD2MXltlWqt7k%3D] 10.1016/j.surfcoat.2004.10.064View Article
  9. Modes. T, Scheffel B, Meetzner Chr, Zywitzki O, Reinhold E: Surf. Coat. Technol.. 2005, 200: 306. COI number [1:CAS:528:DC%2BD2MXpvFahtbc%3D] 10.1016/j.surfcoat.2005.02.080View Article
  10. W. Ho, J.C. Yu, S. Lee, Appl. Catal. B: Environ. DOI:10.1016/j.apcatb.2006.06.019 (2006)
  11. Mathur S, Kuhn P: Surf. Coat. Technol.. 2006, 201: 807. COI number [1:CAS:528:DC%2BD28XptlOhs70%3D] 10.1016/j.surfcoat.2005.12.039View Article
  12. Frach P, Gloss D, Metzner Chr, Modes T, Scheffel B, Zywitzki O: Vacuum. 2006, 80: 679. COI number [1:CAS:528:DC%2BD28XltVersr8%3D] 10.1016/j.vacuum.2005.11.001View Article
  13. Amor SB, Guedri L, Baud G, Jacquet M, Ghedira M: Mater. Chem. Phys.. 2002, 77: 903. 10.1016/S0254-0584(02)00189-XView Article
  14. Hou Y-Q, Zhuang D-M, Zhang G, Zhao M, Wu M-S: App. Surf. Sci.. 2003, 218: 97. COI number [1:CAS:528:DC%2BD3sXntVKjsbY%3D] 10.1016/S0169-4332(03)00569-5View Article
  15. Frach P, Gloss D, Goedicke K, Fahland M, Gnehr W-M: Thin Solid Films. 2003, 445: 251. COI number [1:CAS:528:DC%2BD3sXps1Citrw%3D] 10.1016/S0040-6090(03)01153-2View Article
  16. Zywitzki O, Modes T, Sahm H, Frach P, Goedicke K, Gloss D: Surf. Coat. Technol.. 2004, 180–181: 538. 10.1016/j.surfcoat.2003.10.115View Article
  17. Barnes C, Kumar S, Green L, Hwang N-M, Gerson AR: Surf. Coat. Technol.. 2005, 190: 321. COI number [1:CAS:528:DC%2BD2cXhtVakurjN] 10.1016/j.surfcoat.2004.04.003View Article
  18. Ohno S, Takasawa T, Sato Y, Yoshikawa M, Suzuki K, Frach P, Shigesato Y: Thin Solid Films. 2006, 496: 126. COI number [1:CAS:528:DC%2BD2MXht1Gls77P] 10.1016/j.tsf.2005.08.252View Article
  19. Lapostolle F, Perry F, Billard A: Surf. Coat. Technol.. 2006, 201: 2633. COI number [1:CAS:528:DC%2BD28Xht1agsrbO] 10.1016/j.surfcoat.2006.05.015View Article
  20. Baroch P, Musil J, Vlcek J, Nam KH, Han JG: Surf. Coat. Technol.. 2005, 193: 107. COI number [1:CAS:528:DC%2BD2MXhtleks7o%3D] 10.1016/j.surfcoat.2004.07.060View Article
  21. D. Herman, J. Musil, J. Sicha, Photoactivated properties of TiO2 films prepared by magnetron sputtering, Proceedings of the PSE 2006 in Plasma Processes & Polymers, accepted for publication, November 2006
  22. Welzel Th, Dunger Th, Richter F: Surf. Coat. Technol.. 2006, 201: 3959. COI number [1:CAS:528:DC%2BD28Xht1Cisb%2FL] 10.1016/j.surfcoat.2006.08.003View Article
  23. Musil J, Baroch P, Vlček J, Nam KH, Han JG: Thin Solid Films. 2005, 475: 208. COI number [1:CAS:528:DC%2BD2MXhtVKgtbg%3D] 10.1016/j.tsf.2004.07.041View Article
  24. Bradley JW, Bäcker H, Kelly PJ, Arnell RD: Surf. Coat. Technol.. 2001, 142: 337. 10.1016/S0257-8972(01)01084-2View Article
  25. Zheng SK, Wang TM, Xiang G, Wang C: Vacuum. 2001, 62: 361. COI number [1:CAS:528:DC%2BD3MXkvFSiu7c%3D] 10.1016/S0042-207X(01)00353-0View Article
  26. Safi I: Surf. Coat. Technol.. 2000, 127: 203. COI number [1:CAS:528:DC%2BD3cXktVSju7Y%3D] 10.1016/S0257-8972(00)00566-1View Article
  27. Berg S, Nyberg T: Thin Solid Films. 2005, 476: 215. COI number [1:CAS:528:DC%2BD2MXhvF2itr8%3D] 10.1016/j.tsf.2004.10.051View Article
  28. J. Sicha, J. Musil, D. Herman, Z. Stryhal, J. Pavlik, Surface morphology of magnetron sputtered TiO2 films, Proceedings of the PSE 2006 in Plasma Processes & Polymers, accepted for publication, November 2006


© to the authors 2007