The InN epitaxy via controlling In bilayer
© Zhou et al.; licensee Springer. 2014
Received: 3 November 2013
Accepted: 18 December 2013
Published: 6 January 2014
The method of In bilayer pre-deposition and penetrated nitridation had been proposed, which had been proven to have many advantages theoretically. To study the growth behavior of this method experimentally, various pulse times of trimethylindium supply were used to get the optimal indium bilayer controlling by metalorganic vapour phase epitaxy. The results revealed that the InN film quality became better as the thickness of the top indium atomic layers was close to bilayer. A following tuning of nitridation process enhanced the quality of InN film further, which means that a moderate, stable, and slow nitridation process by NH3 flow also plays the key role in growing better-quality InN film. Meanwhile, the biaxial strain of InN film was gradually relaxing when the flatness was increasingly improved.
KeywordsInN epitaxy MOVPE Bilayer control Penetrated nitridation
The unique properties of InN are currently attracting much interest in the research community [1, 2]. Because of its lowest effective mass and the highest electron drift velocity among all III-nitride semiconductors , InN is promising for high-speed and high-frequency electronic devices. And recently, the band gap of InN, which is considered as 1.9 eV, is renewed to approximately 0.7 eV [4–6], covering a broad range of wavelength from near infrared at approximately 1.5 μm to ultraviolet at approximately 200 nm based on its direct band gap alloying with GaN and AlN [7–9]. However, the achievement of high crystalline quality InN film is still a great challenge, which attributed to the lack of lattice-matched substrate, the low dissociation temperature (approximately 600°C), the low pyrolysis efficiency of NH3 at 500 to 600°C, the pre-reaction of the precursors before arriving at the substrate surface, and also the InN clustering effect [10–14].
In order to achieve high-quality InN film, effort has been made by researchers with different methods such as optimizing growth temperature, controlling V/III ratio, introducing buffer layer, or employing pulsed atomic layer epitaxy technique [15, 16]. However, the crystalline quality of InN film is still far below a satisfactory level due to the existence of huge quantity of defects . To elucidate the original difficulty in In film deposition, the formation kinetics of InN with N and In atoms on the In polar GaN surface has been systematically studied by first-principles calculations , it was found that the pre-deposition of In bilayer on the surface could improve the In migration on the surface and the smoothness of In film.
In this work, the epitaxy method of In bilayer controlling and penetrated nitridation was employed for the InN film growth on GaN template. In order to determine critical trimethylindium (TMI) flow required for forming In bilayer, the pulse time of TMI supply was optimized. The results revealed that the film quality became better as the thickness of the top indium atomic layers was close to bilayer. Based on the In bilayer deposition, a moderate, stable, and slow nitridation process by NH3 flow also played the key role in growing better-quality InN film. X-ray diffraction (XRD) measurements confirmed the gradual relaxation of biaxial strain in InN epilayers during increment of the smoothness.
Growth of samples
The thickness of film was measured by in situ growth monitoring curves (Panalytical X'pert PRO X, Panalytical, Almelo, The Netherlands). The surface morphology and smoothness of the as-grown samples were characterized by atomic force microscopy (AFM, PicoSPM and PSI XE-100, Molecular Imaging, Ann Arbor, MI, USA) and scanning electron microscopy (SEM, LEO 1530, LEO Elektronenmikroskopie GmbH, Oberkochen, Germany) equipped with an energy-dispersive X-ray spectrometer (EDX). The structural quality and the In composition of InN films were evaluated by X-ray diffraction (XRD) in a X’ Pert PRO system.
Results and discussion
Figure 3 shows the SEM images of surface morphology and cross sections of samples A to D. From the top view of sample A (A1), one can see some obvious dark holes on the surface, indicating the formation of vacancies due to In accumulation in droplets. The formation of holes and droplets easily leads to a pretty rough surface (rms = 33, from AFM scanning result), as shown in Figure 3A2. As we know, the melting temperature of metal In is only about 157°C. Thus, under the growth temperature of InN (550°C), the pulsed deposition of In for a long duration time may form a thick liquid In layer on the surface. By the effect of surface tension, In droplets in large size would come into being quickly. This is the main reason governing the surface roughness. In order to reduce the roughness, the pulse time of TMI is reduced to 8 s for sample B. The obtained InN film shows better flatness (rms = 20) and dark holes have been well removed (Figure 3B2). According to the theoretical simulation of the kinetics of InN formation , if the thickness of indium film is larger than two atomic layers, the nitridation of this In film could not well form a InN epilayers in correct stoichiometric ratio (1:1) and the excessive In will lead to roughness. Thus, the TMI pulse time was further decreased down to 4 s. As shown in Figure 3C1, the islands of sample C begin to show regular shape relatively and the surface becomes more flat (rms = 14). Meanwhile, it can be observed that there are some islands in larger size, as indicated by arrow. The number of these types of large islands further increases in sample D (Figure 3D1), in which the TMI pulse time was set to 3 s. This trend of quality deterioration implies that the indium film deposited during the TMI period turns to be less than one atomic layer and fail to construct indium bilayer. This insufficient coverage of indium layer could not provide the advantage of nitridation of indium bi-layer structure. On the contrary, over-nitridation under N-rich condition leads to the deterioration of the InN film quality of sample D. Therefore, it could be determined that 4-s pulsed supply of TMI in sample C is the optimal setting.
XRD peak position of (002) diffraction and main lattice constants of InN films for our samples
Through using various pulse times of TMI supply, we achieved optimal indium bilayer control by metalorganic vapour phase epitaxy. When the top indium multilayer was getting close to bilayer, InN film quality had been gradually improved due to high surface migration and good structure consistency of indium bilayer forming. The absorption spectra also confirmed that the InN film which was grown via optimal indium pre-deposited controlling had the fewest defects and impurities. Furthermore, an optimization of ammonia flow during the nitridation stage made an extraordinary improvement of the InN film's flatness; it means that based on the In bilayer controlling deposition, a moderate, stable, and slow nitridation process also plays the key role in growing better-quality InN film. Meanwhile, the biaxial strain of InN film was gradually relaxing when the parameters of growth was optimizing, implying that the mismatch stress of InN heteroepitaxy can be well relaxed via this growth method.
This work was partly supported by ‘973’ programs (2012CB619301 and 2011CB925600) and the NNSF (61227009, 11204254, and 91321102).
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