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Applications of Atomic Layer Deposition

Call for papers

The atomic layer deposition (ALD) technique has been widely used and explored in numerous fields such as microelectronics, photoelectronics, optical coating, functional nanomaterials, MEMS/NEMS, energy storage, biotechnology, catalysis technology and etc. This is attributed to some unique advantages of ALD, including precise control of nano-scale thickness, superior uniformity across a large area, excellent conformity, relatively low deposition temperature and stoichiometric composition. This thematic series in Nanoscale Research Letters is focused on recent progresses in ALD-related researches. The scope includes both theoretical and experimental investigations related to basic principle and practical application of ALD. The future direction is also discussed. 

Suggested topics may include, but are not limited to:

  • ALD Precursors and Precursor Design
  • Simulation, Modeling, and Theory of ALD Growth
  • Surface Chemistry/Preparation for ALD
  • Patterned and Selective Area ALD
  • In-situ Monitoring and Analysis during ALD Growth
  • Plasma and Other Energy-Enhanced ALD Methods
  • Applications of ALD for Microelectronics
  • Energy Storage Applications of ALD
  • Applications of ALD for Photovoltaics
  • ALD Applications in Optics and Display
  • ALD for Flexible and Organic Electronics
  • ALD for Catalysis
  • ALD for Medical and Biological Applications
  • ALE Technology

View articles published in the collection so far

Lead Guest Editor
Gaoshan Huang, Fudan University, China    

Guest Editors
Wen-Jun Liu, Fudan University, China
Xinwei Wang, Peking University Shenzhen Graduate School, China

Submission instructions
Before submitting your manuscript, please ensure you have carefully read the submission guidelines for Nanoscale Research Letters. The complete manuscript should be submitted through the Nanoscale Research Letters submission system. To ensure that you submit to the correct thematic series please select the appropriate thematic series in the drop-down menu upon submission. In addition, indicate within your cover letter that you wish your manuscript to be considered as part of the thematic series 'Applications of Atomic Layer Deposition'. All submissions will undergo rigorous peer review and accepted articles will be published within the journal as a collection.

Submissions will also benefit from the usual advantages of open access publication:

  • Rapid publication: Online submission, electronic peer review and production make the process of publishing your article simple and efficient
  • High visibility and international readership in your field: Open access publication ensures high visibility and maximum exposure for your work - anyone with online access can read your article
  • No space constraints: Publishing online means unlimited space for figures, extensive data and video footage
  • Authors retain copyright, licensing the article under a Creative Commons license: articles can be freely redistributed and reused as long as the article is correctly attributed

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