Figure 10
From: Strategies for Controlled Placement of Nanoscale Building Blocks
SEM images after positively charged silver nanoparticles were sprayed onto the negatively charged e-beam pattern. About 0.7 μm thick lines were generated over a large area with doses as low as 50 nC/cm2, showing the feasibility of ultrafast patterning by electrostatic lithography. (A) Scale bar = 50 μm. (B) Scale bar = 10 μm. (Reprinted with permission from Reference [133]. Copyright 2006 AVS The Science & Technology Society.)