Figure 5From: A Novel Self-aligned and Maskless Process for Formation of Highly Uniform Arrays of Nanoholes and NanopillarsSEM images of (a) a gold nanostructure with a thickness of 70 nm by lift-off process with 5 nm Cr as the adhesion layer; (b) gold nanoholes with a thickness of 100 nm by lift-off process with 5 nm Ti as the adhesion layerBack to article page