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Table 1 Deposition rateaD, thicknessh, WDCA after UV irradiation for 20, 60 and 300 min and optical band gapEgof ~500–700 nm thick TiO2films reactively sputter-deposited atId = 2 A,pT = 1.5 Pa,Us = Uflon unheated glass substrate as a function of partial pressure of oxygen

From: Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films

(Pa) h(nm) aD(nm/min) WDCA (°) after UV irradiation for Eg(eV)
20 min 60 min 300 min
0.2 600 12.5 89 84 71
0.3 700 6.6 38 18 11 3.21
0.5 600 5.4 15 13 13 3.21
0.7 700 5.2 19 12 8 3.19
0.9 600 4.4 20 16 11 3.11
1.1 600 4.4 16 13 9 3.12
1.3 600 4.6 22 16 11 3.06
1.5 500 4.4 23 14 8 3.11
  1. Eg was determined using the formula given in [24]