Table 1 Deposition rateaD, thicknessh, WDCA after UV irradiation for 20, 60 and 300 min and optical band gapEgof ~500–700 nm thick TiO2films reactively sputter-deposited atId = 2 A,pT = 1.5 Pa,Us = Uflon unheated glass substrate as a function of partial pressure of oxygen 
From: Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films
| h(nm) | aD(nm/min) | WDCA (°) after UV irradiation for | Eg(eV) | ||
|---|---|---|---|---|---|---|
20 min | 60 min | 300 min | ||||
0.2 | 600 | 12.5 | 89 | 84 | 71 | – |
0.3 | 700 | 6.6 | 38 | 18 | 11 | 3.21 |
0.5 | 600 | 5.4 | 15 | 13 | 13 | 3.21 |
0.7 | 700 | 5.2 | 19 | 12 | 8 | 3.19 |
0.9 | 600 | 4.4 | 20 | 16 | 11 | 3.11 |
1.1 | 600 | 4.4 | 16 | 13 | 9 | 3.12 |
1.3 | 600 | 4.6 | 22 | 16 | 11 | 3.06 |
1.5 | 500 | 4.4 | 23 | 14 | 8 | 3.11 |
(Pa)