Account

Table 2 Deposition ratea_D, thicknessh, WDCA after UV irradiation and optical band gapE_gof thin (~500 nm) and thick (~1,500 nm) TiO₂films reactively sputter-deposited atI_d = 2 A,p_T = 1.5 Pa,U_s = U_flon unheated glass substrate

From: Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films

(Pa)	Thin films						Thick films
	h(nm)	a_D(nm/min)	WDCA after UV irradiation			E_g(eV)	h(nm)	a_D(nm/min)	WDCA after UV irradiation			E_g(eV)
	h(nm)	a_D(nm/min)	20 min	60 min	300 min	E_g(eV)	h(nm)	a_D(nm/min)	20 min	60 min	300 min	E_g(eV)
0.3	700	6.6	38	18	11	3.21	1,500	6.3	18	11	8	3.06
0.7	700	5.2	19	12	8	3.19	1,200	5.8	10	9	9	3.04
0.9	600	4.4	20	16	11	3.11	1,500	5.2	8	9	8	2.86

E_g was determined using the formula given in [24]

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