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Table 2 Deposition rateaD, thicknessh, WDCA after UV irradiation and optical band gapEgof thin (~500 nm) and thick (~1,500 nm) TiO2films reactively sputter-deposited atId = 2 A,pT = 1.5 Pa,Us = Uflon unheated glass substrate

From: Two-Functional Direct Current Sputtered Silver-Containing Titanium Dioxide Thin Films

(Pa) Thin films Thick films
h(nm) aD(nm/min) WDCA after UV irradiation Eg(eV) h(nm) aD(nm/min) WDCA after UV irradiation Eg(eV)
20 min 60 min 300 min 20 min 60 min 300 min
0.3 700 6.6 38 18 11 3.21 1,500 6.3 18 11 8 3.06
0.7 700 5.2 19 12 8 3.19 1,200 5.8 10 9 9 3.04
0.9 600 4.4 20 16 11 3.11 1,500 5.2 8 9 8 2.86
  1. Eg was determined using the formula given in [24]