Figure 4From: A Nanopatterning Technique: DUV Interferometry of a Reactive Plasma Polymer2D periodic patterns generated by double exposure of the plasma deposited polymer film. (Left) both irradiation were carried out with a 300 nm phase mask. (Right) first irradiation was led with 300 nm and second irradiation with 1,000 nm phase mask (rotated of 90° from first irradiation)Back to article page