Figure 4From: Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch MaskSide view of subwavelength antireflection structure array for different etching time. The measured average heights of SAS are:a 230 nm,b 370 nm,c 470 nm, andd 450 nmBack to article page