Figure 3From: Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell ApplicationMeasured optical reflectivity at normal incidence for bare (100) silicon wafer, fabricated 140~150 nm height silicon SWS, SLAR w/silicon nitride of 69.1 nm deposited on silicon wafer and DLAR w/69.1 nm silicon nitride and 56 nm MgF2deposited on silicon waferBack to article page