Figure 1
From: Highly Uniform Epitaxial ZnO Nanorod Arrays for Nanopiezotronics
Schematic process flow of all-ZnO (a–d) and anchored (e–h) nanorod arrays. The processing steps for all-ZnO structure are: surface treatment of ZnO substrates (a), pattern generation in PMMA by e-beam lithography (b), chemical nanowire growth (c), and PMMA removal (d). Processing steps for the anchored ZnO array are: Ru thin film deposition (e), e-beam lithography (f), Ar+ion milling (g), and chemical nanorod growth after PMMA removal (h)