Method
|
T(°C)
|
Time (h)
|
Lattice parameter (Å)
|
Unit cell volume (Å3)
|
Ref. [ ]
|
---|
a
|
b
|
c
|
---|
ALD
|
–
|
–
|
5.1
|
5.2
|
5.3
|
140.556
|
[54]
|
PIAD
|
550
|
3
|
5.09
|
5.15
|
5.24
|
137.358(7)
|
[55]
|
LDA
|
–
|
–
|
5.106
|
5.165
|
5.281
|
139.273(1)
|
[56]
|
MH
|
140
|
1
|
5.160(2)
|
5.179(2)
|
5.311(1)
|
66.528(5)
|
[ ]
|
JCPDS
| | |
5.285(1)
|
5.181(9)
|
5.115(7)
|
140.102(9)
|
[52]
|
- T temperature,t time,Ref. references,PIAD Plasma ion assisted deposition,ALD atomic layer deposition,LDA local-density approximation, and [
] This work