Table 1 Influence of sputtering powerW Son texture coefficientT C, film thickness, grain size and surface root-mean-square (RMS) roughness of TiN thin films
From: Nanoscale Visualization of Elastic Inhomogeneities at TiN Coatings Using Ultrasonic Force Microscopy
W S(W) | T C(200) | T C(111) | Film thickness (μm) | Grain size (nm) | RMS-AFM roughness (nm) |
|---|---|---|---|---|---|
100 | 0.80 | 0.20 | 1.7 ± 0.11 | 225 ± 39 | 25.2 ± 1.2 |
150 | 0.79 | 0.21 | 2.1 ± 0.13 | 297 ± 57 | 33.1 ± 1.1 |
200 | 0.83 | 0.17 | 2.9 ± 0.09 | 203 ± 74 | 23.5 ± 1.7 |