Figure 1From: Influence of Ni Catalyst Layer and TiN Diffusion Barrier on Carbon Nanotube Growth RateSEM photographs of samples with a constant TiN thickness of 100 nm and varying Ni thickness (first column) after the H2 plasma pretreatment at 4 Torr, 900 W (second column) after 2-min growth at 5 Torr, 900 W and (third column) after 20-min growth at 5 Torr, 900 WBack to article page