Table 1 The experimental parameters for the Ni-BaTiO3 film fabrication
From: Self-Organized Ni Nanocrystal Embedded in BaTiO3 Epitaxial Film
Background vacuum | ~3 × 10−6 Pa |
Working vacuum | ~5 × 10−5 Pa |
Substrate | SrTiO3 (001) |
Substrate temperature | ~650°C |
Target | BaTiO3 purity > 99.9% Ni purity > 99.9% |
Annealing condition | 650°C, 30 min 10 Pa O2 pressure |
Laser energy density | 248 nm, 2–3 J/cm2 |
Laser pulse frequency | 1 Hz for BaTiO3 deposition 1 Hz for SrTiO3 deposition 2 Hz for Ni deposition |