Figure 3
From: Fabrication of Coaxial Si1−x Ge x Heterostructure Nanowires by O2 Flow-Induced Bifurcate Reactions
a The synchrotron XRD pattern of Ge/Si1−x Ge x coaxial heterostructure nanowires. b TEM image and EDS profile in the radial direction of Ge/Si1−xGe x coaxial heterostructure nanowires. Inset is SEM image of the heterostructure nanowires. c TEM images measuring the thickness of core and shell as a function of time. Inset is schematic of the deposition procedure. d Plot of the thickness of Ge shell versus the diameter of Si1−x Ge x core nanowires