Figure 3From: An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon SubstrateEffect of the nanosilver colloidal solvent on the nanosilver island transformation: a 3 wt% in non-polar solvent including xylene, etc., b 5 wt% in IPA (polar solvent), c 5 wt% in IPABack to article page