Figure 8From: An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon SubstrateAntireflective nanostructure array after etching and removal of nanosilver residues for the samples processed at 2,000 rpm and 5 wt%: etch time of a 40 s, b 60 sBack to article page