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Table 1 Quantitative analysis of nanosilver islands in different zone of the deposited wafer

From: An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

Spin speed (rpm)

Nanosilver concentration (wt%)

Center

Periphery

Ave. (nm)

SD (nm)

Coverage (%)

Ave. (nm)

SD (nm)

Coverage (%)

2,000

3

69.5

27.0

36.5

63.3

19.3

44.9

5

79.3

37.1

51.6

92.4

52.9

64.0

4,000

3

58.1

17.9

53.2

47.7

11.2

46.0

5

62.6

28.8

64.0

65.7

29.4

65.2

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