Figure 6From: Synthesis and Photoluminescence Properties of Porous Silicon Nanowire ArraysThe PL spectrums of the SiNWs with different preparation parameters. a,b Correspond to the samples with HF treatment, c,d correspond to the samples with HNO3 treatment. (1)–(5) in a and c correspond to the SiNWs etched for 60 min with the H2O2 concentrations of 0.1, 0.2, 0.3, 0.4 and 0.5 M, respectively. (1)–(5) in b and d correspond to the SiNWs etched with 0.3 M H2O2 for 30, 60, 90, 120, and 180 min, respectivelyBack to article page