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Table 1 Thicknesses of the Al
2
O
3
and SiO
2
layers obtained from X-ray reflectrometry on the amorphous and polycrystalline samples
From:
Polycrystallization effects on the nanoscale electrical properties of high-k dielectrics
Phase
Al
2
O
3
thickness (nm)
SiO
2
thickness (nm)
EOT (nm)
Amorphous
14.6
1.0
7.3
Polycrystalline
12.4
1.2
6.6
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