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Figure 5 | Nanoscale Research Letters

Figure 5

From: Study of the formation processes of gold droplet arrays on Si substrates by high temperature anneals

Figure 5

AFM images of the surfaces of 3-nmthick gold films deposited onto the Wacker-Chemitronic Si substrates with the natural oxide layer after 15 s RTA: (a) 400°C; (b) 700°C; (c) 950°C; and (d) 1050°C. The maps of heights are shown on the left hand side; the same maps with distinguished grain boundaries are shown on the right hand side. For quantitative parameters see Figure 6.

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