Figure 1
From: Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography
Schematic diagram depiction of the ZnO patterning process using the polymer template formed by nanoimprint lithography: (a) PMMA coating, (b) resin coating pattern, (c) stamp fabrication, (d) imprint process, (e) demolding, (f) residual layer removing, (g) OTS self assembly monolayer, (h) PR removal and ZnO seed layer coating, (i) annealing and O2 plasma treatment, and (j) ZnO growing.