Figure 1From: Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters PL spectra for as-deposited SRSN films grown by (a) PECVD, (b) ECR PECVD, and (c) ICP CVD with their respective excess silicon contents specified in the legend. As excess silicon content increases, emission shifts to lower energies.Back to article page