Figure 2From: Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters PL spectra for films annealed for 60 min in a quartz tube furnace. Shown are an ICP CVD film (Siex < 1%) annealed in (a) N2, (b) N2 + 5% H2 and a PECVD film (Siex = 3%) annealed in (c) N2, and (d) N2 + 5% H2.Back to article page