Figure 3From: Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters TEY-XANES spectra for (a) PECVD, (b) ECR PECVD, and (c) ICP CVD AD films at the Si K-edge. A, B, and C indicate the peak positions for Si-Si, Si-N, and Si-O resonances, respectively. The percentages in the legend refer to the excess silicon content of the SRSN films.Back to article page