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Figure 4 | Nanoscale Research Letters

Figure 4

From: Effect of thermal treatment on the growth, structure and luminescence of nitride-passivated silicon nanoclusters

Figure 4

FLY-XANES spectra for as-deposited (a) PECVD and (b) ICP CVD films at the Si L 3,2 -edge. The spectra are offset by a constant value in the order they are listed in the legend, in which the excess silicon content of the SRSN films is specified as a percentage. The Si-N resonance peak shifts to lower energies in films with higher excess silicon content.

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