Figure 1From: Structure-dependent growth control in nanowire synthesis via on-film formation of nanowires Growth and X-ray diffraction (XRD) patterns of Bi sputtered films. (a) Schematic representation of the growth of Bi nanowires by OFF-ON. XRD patterns of Bi films before and after heat treatment at 270°C for 10 h. The films were deposited at a rate of (b) 2.7 Å/sec (RF power: 10 W) and (c) 32.7 Å/s (RF power: 100 W), respectively.Back to article page