Figure 4
From: Simple two-step fabrication method of Bi2Te3 nanowires
A cross section of a Bi 2 Te 3 nanowire. (a) Pt is deposited locally to protect Bi2Te3 nanowire during the dual beam FIB process. (b) A SEM image shows the cross section of Bi2Te3 nanowire. (c) A low-magnification TEM image of the cross section of Bi2Te3 nanowire. There is no interface between the original Bi core and the Bi2Te3 shell after annealing. A SAED pattern and a HR-TEM image reveal that Bi2Te3 nanowire is highly single-crystalline across the nanowire.