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Table 1 Processing conditions used for depositing the VO2 films

From: Synthesis and characterization of VO2-based thermochromic thin films for energy-efficient windows

  W- and Mo-doped films Nb-doped films
Base pressure (mbar) 3 × 10-5 3 × 10-5
Work pressure (mbar) 4 × 10-3 1 × 10-3
Oxygen/argon ratio (%) 14.3 50
Total gas flow (sccm) 19.2 6
DC current (A) 0.5 -
Pulsed-DC current (A) - 0.58
Frequency (kHz) - 10
Reverse time (μs) - 5
Substrate temperature (°C) 450 450
Deposition time (min) 5 3