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Figure 3 | Nanoscale Research Letters

Figure 3

From: Reliable processing of graphene using metal etchmasks

Figure 3

On the right severe delamination of graphene caused by resist (blue) removal. With metal mask no delamination occurs as shown on left (scale bar represents 10 μm). The inset shows typical Raman spectrum of etched graphene, note the smaller barely noticeable D peak (approx. 1350 cm-1) compared to Figure 1.

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