Skip to main content
Account
Figure 4 | Nanoscale Research Letters

Figure 4

From: Reliable processing of graphene using metal etchmasks

Figure 4

Graphene ribbons contacted from top on Al 2 O 3 substrates with nickel contacts. The FET measurements were taken between two inner electrodes as source and drain, and substrate was gated from back. On the right, an I sd - V g characteristic of the device is shown at V sd of 50 mV.

Back to article page

Navigation