Figure 1From: Enhanced photo-sensitivity through an increased light-trapping on Si by surface nano-structuring using MWCNT etch mask (a) 3D AFM images of bare-Si. (b) Conventional wet chemical etched Si using square masks. (c) ICP-etched Si surface using MWCNT-dispersion in isopropyl-alcohol. (d) ICP-etched Si using MWCNT-dispersion in HMDS. 3D AFM images in (a-d) are 7 (x) × 7 (y) μm2.Back to article page