Annealing of gold nanostructures sputtered on polytetrafluoroethylene

Table 1 Atomic concentrations

AU layer thickness	Temperature	Atomic concentrations of elements in at.%
		C	C ^PTFE	O	Au	F	F/C ^PTF
20 nm	RT	43.5	4.4	6.5	41.6	8.5	1.93
	300°C	37.8	34.8	0.4	3.4	58.4	1.68
80 nm	RT	41.0	3.1	4.4	48.6	6.0	1.94
	300°C	36.8	27.2	1.2	14.8	47.2	1.74

Atomic concentrations (in atomic percent) of C (1s), O (1s), Au (4f), and F(1s) in Au-sputtered PTFE samples with Au effective thickness 20 and 80 nm after deposition (RT) a after annealing (300°C) measured by XPS. C^PTFE, calculated concentration from XPS data of carbon (in atomic percent) originating from PTFE only; F/C^PTFE, stands for fluorine to PTFE carbon ratio.