Figure 7From: Si nanowires by a single-step metal-assisted chemical etching process on lithographically defined areas: formation kinetics SEM images of the samples right after the MACE process and before the Ag removal. Dendrite Ag nanostructures on the SiNW surface during the MACE process on non-patterned areas (a) and on lithographically defined 2 × 2-μm2 surface areas (b).Back to article page