Figure 4From: SiO x /SiN y multilayers for photovoltaic and photonic applicationsHRTEM (a) and EFTEM (b, c) images. SiO x /SiN y ML annealed at TA = 1,000°C, tA = 1 min by filtering the energy at SiO2 plasmon (b) and Si plasmon (c) energies, respectively.Back to article page