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Figure 10 | Nanoscale Research Letters

Figure 10

From: Fabrication mechanism of friction-induced selective etching on Si(100) surface

Figure 10

Scanning Auger nanoprobe analysis on friction-induced mesa surface. (a) The elemental composition of the friction-induced mesa and original silicon substrate. The lower left insert shows the SEM image of the tested mesa. (b) Oxygen atomic concentration distribution on four different surfaces: original silicon, original mesa, mesa etched in 10 wt.% HF solution for 3 min, and mesa etched in 10 wt.% HF solution for 3 min and then in 20 wt.% KOH + IPA solution for 2 min.

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