Figure 5From: Fabrication mechanism of friction-induced selective etching on Si(100) surfaceEffects of etching time on height of the nanostructure on Si(100) surface by scratching and post-etching. The scratching load is 60 mN, and the etching solution is 20 wt.% KOH + IPA solution. The error bars displayed the statistical results of the etching height.Back to article page