Figure 4From: Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin filmsContour maps of an FTO thin film on a PET substrate for working pressure variations. The working pressures were varied at (a) 5 mTorr, (b) 7.5 mTorr, (c) 10 mTorr, (d) 12.5 mTorr, and (e) 15 mTorr. (f) The sheet resistance uniformity and figure of merit of the FTO thin film under working pressure variations.Back to article page