Figure 11From: Removal of 10-nm contaminant particles from Si wafers using CO2 bullet particlesSEM images after cleaning of 10-nm Al 2 O 3 p articles using different ratios of CO 2 /He mixtures. SEM images after cleaning of 10-nm Al2O3 particles on Si surface using (a) pure CO2 at 5 bar, (b) 1:1 CO2/He at 10 bar, (c) 1:4 CO2/He at 25 bar, and (d) 1:9 CO2/He at 50 bar with 1/3 throat diameter.Back to article page