Figure 12From: Removal of 10-nm contaminant particles from Si wafers using CO2 bullet particlesSEM images after cleaning of 10-nm Al 2 O 3 particles at different chamber pressures. SEM images after cleaning of 10-nm Al2O3 particles on Si surface using pure CO2 at different chamber pressures (Pc): (a) Pc = 3.7 Torr at 10 bar, (b) Pc = 0.37 Torr at 10 bar, (c) Pc = 8.4 Torr at 30 bar, (d) Pc = 0.84 Torr at 30 bar, (e) Pc = 11 Torr at 50 bar, and (f) Pc = 1.1 Torr at 50 bar.Back to article page