Figure 8From: Removal of 10-nm contaminant particles from Si wafers using CO2 bullet particlesSEM images of 10-nm Al 2 O 3 particles before and after cleaning using 1:4 CO 2 /He BPs. SEM images before (a) and after (b-f) cleaning of 10-nm Al2O3 particles on Si surface using 1:4 CO2/He BPs generated with 1/3 throat diameter.Back to article page