Table 1 Sputtering conditions of ZnS films
From: Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
Parameter | Condition |
|---|---|
Target | ZnS (99.99% pure) |
Substrate | Corning E2000 glass |
RF power | 120 W |
Sputtering gas | Pure argon (55 sccm) |
Deposition time | 20 min |
Sputtering pressure | 3 × 10-2 Torr |
Substrate temperature | 100°C, 200°C, 250°C, 300°C, 350°C, 400°C |
Target to substrate distance | 50 mm |