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Table 1 Sputtering conditions of ZnS films

From: Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering

Parameter Condition
Target ZnS (99.99% pure)
Substrate Corning E2000 glass
RF power 120 W
Sputtering gas Pure argon (55 sccm)
Deposition time 20 min
Sputtering pressure 3 × 10-2 Torr
Substrate temperature 100°C, 200°C, 250°C, 300°C, 350°C, 400°C
Target to substrate distance 50 mm