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Figure 4 | Nanoscale Research Letters

Figure 4

From: Analysis of p-Si macropore etching using FFT-impedance spectroscopy

Figure 4

Example of in situ extractions of fitting parameters and additional calculated parameters. The data show the stability of the pore etching process after a nucleation period of around 7 min. The short horizontal lines show the average of the steady state values that are used in what follows. Pores here were etched with DMF 5%(5.4%).

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