Figure 2From: Electroless etching of Si with IO3– and related speciesSEM micrographs of Si(100) wafers etched in 0.07 M HIO 3 in 3:5 ethanol/HF solutions. (a) Etch time = 300 s, 45° perspective. (b) Etch time = 900 s, plan view. (c) Etch time = 1800 s, plan view. (d) Cross section of sample shown in (b).Back to article page