Figure 2From: A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxaneSchematic illustration UV-assisted thermal curing imprint process. (a) Preexposure of the epoxysiloxane resist by a cold UV-light; (b) imprint with a mold that can be opaque; (c) thermal curing the imprinted resist; and (d) mold release from the resist.Back to article page