Figure 3From: A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxaneFTIR spectra of PMHS polysiloxanes reacted with VCHE at different stages. (a) Pure PMHS precursor; (b) reacted at 35°C for 24 h; (c) reacted at 35°C for 24 h and then at 80°C for 24 h.Back to article page