Figure 7From: A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxaneHigh aspect ratio pattern transfer using two-step RIE. The inset shows a high magnification SEM image of 60-nm-wide, 280-nm-high grating lines of 200-nm pitch in which the high aspect ratio (4.7) of the resist stacks is demonstrated. Samples were titled 45° for the cross-section imaging.Back to article page