Figure 6From: Growth and characterization of TiO2 nanotubes from sputtered Ti film on Si substrateChange in the root mean square surface roughness of the tubes with anodization time. (a) The samples were anodized at 20 V. Inset SEM micrographs showing the change in surface morphology after anodizing for 0, 0.35, and 10 min. (b) AFM image of the Ti film surface after anodization at 20 V for 10 min. The sputtered film thickness was about 650 nm.Back to article page