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Table 3 45-nm process propagation delay computation between CNTFET (with and without interconnect) and MOSFET (post-layout simulation)

From: Device and circuit-level performance of carbon nanotube field-effect transistor with benchmarking against a nano-MOSFET

Logic circuits

CNTFET with 45-nm process design guidelines

MOSFET with 45-nm process

 

Delay without interconnects

Delay with 5-μm interconnect

Delay (post-layout simulation)

 

Propagation delay,

Propagation delay,

Propagation delay,

 

 t p(ps)

 t p(ps)

 t p(ps)

NOT

0.14

9.277

5.005

NAND2

0.39

12.97

8.719

NAND3

0.61

16.87

11.343

NOR2

0.47

12.98

8.797

NOR3

0.50

16.48

11.655

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